Production of Microsectioning Apparatus for Diffusion Study and Preliminary Measurement of Self-Diffusivity of Copper in Low Temperature Range

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Periodical:

Defect and Diffusion Forum (Volumes 95-98)

Edited by:

M. Koiwa, K. Hirano, H. Nakajima and T. Okada

Pages:

741-746

Citation:

S.-I. Fujikawa and K.-I. Itagaki, "Production of Microsectioning Apparatus for Diffusion Study and Preliminary Measurement of Self-Diffusivity of Copper in Low Temperature Range", Defect and Diffusion Forum, Vols. 95-98, pp. 741-746, 1993

Online since:

January 1993

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