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HomeDefect and Diffusion ForumDefect and Diffusion Forum Vols. 95-98Production of Microsectioning Apparatus for...

Production of Microsectioning Apparatus for Diffusion Study and Preliminary Measurement of Self-Diffusivity of Copper in Low Temperature Range

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Diffusion in Materials - DIMAT 1992

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Periodical:

Defect and Diffusion Forum (Volumes 95-98)

Pages:

741-746

DOI:

https://doi.org/10.4028/www.scientific.net/DDF.95-98.741

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Online since:

January 1993

Authors:

S.-I. Fujikawa, K.-I. Itagaki

Keywords:

Copper (Cu), Duo-Plasmatron Ion Source, Ion-Beam Sputtering, Low Temperature Diffusion, Microsectioning Technique, Radioactive-Tracer Diffusion, Self-Diffusion, Serial Sectioning, Sputter Sectioning

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© 1993 Trans Tech Publications Ltd. All Rights Reserved

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