Production of Microsectioning Apparatus for Diffusion Study and Preliminary Measurement of Self-Diffusivity of Copper in Low Temperature Range

Abstract:

Article Preview

Info:

Periodical:

Defect and Diffusion Forum (Volumes 95-98)

Edited by:

M. Koiwa, K. Hirano, H. Nakajima and T. Okada

Pages:

741-746

DOI:

10.4028/www.scientific.net/DDF.95-98.741

Citation:

S.-I. Fujikawa and K.-I. Itagaki, "Production of Microsectioning Apparatus for Diffusion Study and Preliminary Measurement of Self-Diffusivity of Copper in Low Temperature Range", Defect and Diffusion Forum, Vols. 95-98, pp. 741-746, 1993

Online since:

January 1993

Export:

Price:

$35.00

In order to see related information, you need to Login.