Preparation of a Thin Film of Al / Al2O3 Using a Single Source Precursor

Abstract:

Article Preview

Info:

Edited by:

Jung-Ho Ahn and Yoo-Dong Hahn

Pages:

279-282

DOI:

10.4028/www.scientific.net/JMNM.15-16.279

Citation:

M. Veith and K. Andres, "Preparation of a Thin Film of Al / Al2O3 Using a Single Source Precursor", Journal of Metastable and Nanocrystalline Materials, Vols. 15-16, pp. 279-282, 2003

Online since:

April 2003

Authors:

Export:

Price:

$35.00

In order to see related information, you need to Login.