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HomeJournal of Metastable and Nanocrystalline...Journal of Metastable and Nanocrystalline...Preparation of a Thin Film of Al / Al2O3 Using a...

Preparation of a Thin Film of Al / Al₂O₃ Using a Single Source Precursor

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Metastable, Mechanically Alloyed and Nanocrystalline Materials 2002

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Periodical:

Journal of Metastable and Nanocrystalline Materials (Volumes 15-16)

Pages:

279-282

DOI:

https://doi.org/10.4028/www.scientific.net/JMNM.15-16.279

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Online since:

April 2003

Authors:

M. Veith, K. Andres

Keywords:

Chemical Vapor Deposition (CVD), Hydrido-Aluminium-Oxide, Metal/Metal Oxide Composites, Single-Source Precursors

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© 2003 Trans Tech Publications Ltd. All Rights Reserved

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