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Influence of Silicon Surface Preparation and Orientation on Diamond Nucleation and Growth in CH4/H2 System Discharge

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Periodical:

Key Engineering Materials (Volumes 132-136)

Pages:

1536-1539

DOI:

https://doi.org/10.4028/www.scientific.net/KEM.132-136.1536

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Online since:

April 1997

Authors:

M. Belmahi, J. Bougdira, H. Chatei, N. Maloufi, M. Rémy, P. Alnot

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© 1997 Trans Tech Publications Ltd. All Rights Reserved

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