A Study of the Relation between Ion Beam Etching and Chemical Etching of Aluminium Thin Films Prepared at Different Experimental Conditions

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Periodical:

Key Engineering Materials (Volumes 20-28)

Pages:

1071-1077

DOI:

10.4028/www.scientific.net/KEM.20-28.1071

Citation:

A.M. Ghander et al., "A Study of the Relation between Ion Beam Etching and Chemical Etching of Aluminium Thin Films Prepared at Different Experimental Conditions", Key Engineering Materials, Vols. 20-28, pp. 1071-1077, 1988

Online since:

January 1991

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