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HomeKey Engineering MaterialsKey Engineering Materials Vols. 224-226Preparation and Properties of SiO2 Thin Films...

Preparation and Properties of SiO₂ Thin Films Derived from Polysilanes Treated with Oxygen Plasma

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High-Performance Ceramics 2001

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Periodical:

Key Engineering Materials (Volumes 224-226)

Pages:

219-224

DOI:

https://doi.org/10.4028/www.scientific.net/KEM.224-226.219

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Online since:

June 2002

Authors:

Zhi Jian Peng, Wen Jie Si, M.N. Xie, H.J. Fu, Shi Wei Lin, He Zhuo Miao

Keywords:

Negative Oxide Charges, O₂ Plasma Treatment, Polysilanes, SiO₂ Thin Film

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© 2002 Trans Tech Publications Ltd. All Rights Reserved

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