Preparation and Properties of SiO2 Thin Films Derived from Polysilanes Treated with Oxygen Plasma

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Periodical:

Key Engineering Materials (Volumes 224-226)

Edited by:

Jianghong Gong and Wei Pan

Pages:

219-224

DOI:

10.4028/www.scientific.net/KEM.224-226.219

Citation:

Z. J. Peng et al., "Preparation and Properties of SiO2 Thin Films Derived from Polysilanes Treated with Oxygen Plasma", Key Engineering Materials, Vols. 224-226, pp. 219-224, 2002

Online since:

June 2002

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$35.00

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