XPS Study of N-doped TiOx Thin Films Prepared By DC Reactive Magnetron Sputtering

Article Preview

Abstract:

You might also be interested in these eBooks

Info:

Periodical:

Pages:

457-462

Citation:

Online since:

September 2003

Export:

Price:

Permissions CCC:

Permissions PLS:

Сopyright:

© 2003 Trans Tech Publications Ltd. All Rights Reserved

Share:

Citation:

[1] A. Fujishima and K. Honda: Nature, Vol. 238 (1972), p.37.

Google Scholar

[2] M. R. Hoffmann and S. T. Martin: Chem. Rev. Vol. 95 (1995), p.69.

Google Scholar

[3] K. T. Ranjit, H. Cohen, I. Willner, S. Bossmann and A.M. Braun: J. Mater. Sci. Vol. 34 (1999), p.5273.

Google Scholar

[4] K.L. Hadjiivanov and D.K. klissurski: Chem. Soc. Rev. Vol. 25 (1995), p.61.

Google Scholar

[5] A. L. Linsebigler, G. Q. Lu and J. T. Yates: Chem. Rev. Vol. 95 (1995), p.735.

Google Scholar

[6] R. Asahi, T. Morikawa, T. Ohwaki, K.Aoki and Y.Taga: Science, Vol. 293 No.13 (July 2001), p.269.

Google Scholar

[7] C.D. Wanger, W.M. Biggs, L.E. Davis: Handbook of X-ray Photoelectron Spectroscopy (PerkinElmer Corporation Physical Electronics Division, Printed in U.S.A., 1979).

Google Scholar

[8] G. Betz and G. K. Wehner: Sputtering by particle bombardment II, in R. Behrisch (Ed.), Topics in Applied Physics. Vol. 52, Springer-Verlag, Berlin, 1983, p.11.

DOI: 10.1007/3-540-12593-0_2

Google Scholar

[9] N.C Saha and H.C. Tompkins: J. Appl. Phys. Vol. 72 (1992), p.3072.

Google Scholar