Silicon Atomic Layer Deposition on Nanocrystalline Diamond

Yan Hui Wang; Jing Lu; X.H. Qi; Jian Bing Zang

doi:10.4028/www.scientific.net/KEM.315-316.436

Paper Titles

Numerical Simulation of Stretch Bending Process and Springback for T Section Aluminum Extrusions
p.416

Arc Envelope Truing of Metal-Bonded Diamond Grinding Wheel by Use of Cone-Shaped Truer
p.421

A New Method of Structural Synthesis about the Partly-DOF Parallel Robot Mechanisms Based on the Screw Theory
p.425

Research in Method of Reliability Optimization Based-On Multi-Objective Fuzzy Matter-Element with Fuzzy Chance Constraint
p.430

Silicon Atomic Layer Deposition on Nanocrystalline Diamond
p.436

Dynamic Characteristic of HSK Tooling System
p.440

Pulse Electric Current Sintering of Iron-Base Powders Prepared by High Energy Milling
p.445

Design and Performance Study of a 3-DOF Micropositioning Table
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Relation Study of Roughness and Glossiness to Fractal for Granite Surface Profiles
p.455

HomeKey Engineering MaterialsKey Engineering Materials Vols. 315-316Silicon Atomic Layer Deposition on Nanocrystalline...

Silicon Atomic Layer Deposition on Nanocrystalline Diamond

Abstract:

Single-phase nanocrystalline diamond composite is very difficult to sinter because of a huge amount of oxygen-containing and nitrogen-containing functional groups adsorbed on the surface of nanocrystalline diamond going against the yielding of diamond-to-diamond bonding. In this paper, silicon film was deposited on nanocrystalline diamond by means of atomic layer deposition (ALD) using silane as precursor, which would promote the sintering of nanocrystalline diamond as the bond. The structure and the morphology of Si-deposited nanocrystalline diamond were thoroughly studied by X-ray diffraction (XRD), high-resolution electron microscopy (HREM) and Fourier transform infrared (FTIR) spectra. The results confirmed that silicon film grew uniformly on every primary particle and functional groups adsorbed on the surface of nanocrystalline diamond were removed by this method.

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Periodical:

Key Engineering Materials (Volumes 315-316)

Pages:

436-439

DOI:

https://doi.org/10.4028/www.scientific.net/KEM.315-316.436

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Online since:

July 2006

Authors:

Yan Hui Wang, Jing Lu, X.H. Qi, Jian Bing Zang

Keywords:

Atomic Layer Deposition (ALD), Nanocrystalline Diamond, Silicon

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