Development of Novel XY Micropositioning Stage

Abstract:

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Along with the rapid development of semiconductor, photonics and ultra-precision engineering, ultra-precision positioning stages are becoming more necessary than ever. In this study, one novel XY micropositioning stage is proposed, in which bi-axis circular notch flexure and cantilever hinge mechanism are optimal designed as bearing to provide smooth and guided motion. The theoretical stiffness of stage is provided and verified by FEM analysis. Finally, the micro-positioning stage is built and its resolution is experimentally validated to be less than 4nm.

Info:

Periodical:

Key Engineering Materials (Volumes 407-408)

Edited by:

Fan Rui, Qiao Lihong, Chen Huawei, Ochi Akio, Usuki Hiroshi and Sekiya Katsuhiko

Pages:

103-106

DOI:

10.4028/www.scientific.net/KEM.407-408.103

Citation:

H. W. Chen et al., "Development of Novel XY Micropositioning Stage", Key Engineering Materials, Vols. 407-408, pp. 103-106, 2009

Online since:

February 2009

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Price:

$35.00

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