Development of Novel XY Micropositioning Stage

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Abstract:

Along with the rapid development of semiconductor, photonics and ultra-precision engineering, ultra-precision positioning stages are becoming more necessary than ever. In this study, one novel XY micropositioning stage is proposed, in which bi-axis circular notch flexure and cantilever hinge mechanism are optimal designed as bearing to provide smooth and guided motion. The theoretical stiffness of stage is provided and verified by FEM analysis. Finally, the micro-positioning stage is built and its resolution is experimentally validated to be less than 4nm.

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Key Engineering Materials (Volumes 407-408)

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103-106

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February 2009

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© 2009 Trans Tech Publications Ltd. All Rights Reserved

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[1] Time s 2nm Displacement nm Fig. 6 Environment noise on the stage -1.

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1. 0 2. 0 3. 0 4. 0 -4.

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[4] [8] [12] [16] [20] [24] [28] [32] Time s 4nm Fig. 7 Resolution of the stage Displacement nm.

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