The Deep Etching Process Based on Parallel Laser Direct Writing System

Abstract:

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Due to the high cost-effectiveness, extra flexibility, and short production cycle, laser direct writing system as a kind of maskless lithography technology has been widely used in the fields of micro-nano-manufacturing. The working principle of the parallel laser direct writing system based on DMD(Digital Micromirror Device) is introduced. A novel negative photoresist -- dry film photoresist is adopted into the study of deep etching for the fabrication of the micro mold. The experimental results show that: the whole process is convenient, efficient and flexible; the precision of the 2-D patterning and the depth of etching is reliable.

Info:

Periodical:

Key Engineering Materials (Volumes 426-427)

Edited by:

Dunwen Zuo, Hun Guo, Guoxing Tang, Weidong Jin, Chunjie Liu and Chun Su

Pages:

265-269

DOI:

10.4028/www.scientific.net/KEM.426-427.265

Citation:

J. Hu et al., "The Deep Etching Process Based on Parallel Laser Direct Writing System", Key Engineering Materials, Vols. 426-427, pp. 265-269, 2010

Online since:

January 2010

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Price:

$35.00

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