Fabrication and Characterization of NiCr/NiSi Functional Thin Films on Temperature Measurement of Cutter Sensor

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NiCr/NiSi functional thin films of temperature measurement of cutter sensor were prepared by means of advanced Twinned microwave ECR plasma source enhanced Radio Frequency (RF) reaction non-balance magnetron sputtering technique. Fabrication technologies of NiCr/NiSi thin films were studied. The Compositions, micro-morphology, general structure and depth of NiCr/NiSi thin films were analyzed by means of Electron Probe, SEM, AFM, step profiler and stereo vision micro operation system. The results showed that NiCr/NiSi thin-films were small depth, uniform compact, smooth and good continuity, composition of which was close to target.

Info:

Periodical:

Key Engineering Materials (Volumes 431-432)

Edited by:

Yingxue Yao, Dunwen Zuo and Xipeng Xu

Pages:

535-538

DOI:

10.4028/www.scientific.net/KEM.431-432.535

Citation:

Y. X. Cui et al., "Fabrication and Characterization of NiCr/NiSi Functional Thin Films on Temperature Measurement of Cutter Sensor", Key Engineering Materials, Vols. 431-432, pp. 535-538, 2010

Online since:

March 2010

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$35.00

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