Fabrication and Characterization of NiCr/NiSi Functional Thin Films on Temperature Measurement of Cutter Sensor
NiCr/NiSi functional thin films of temperature measurement of cutter sensor were prepared by means of advanced Twinned microwave ECR plasma source enhanced Radio Frequency (RF) reaction non-balance magnetron sputtering technique. Fabrication technologies of NiCr/NiSi thin films were studied. The Compositions, micro-morphology, general structure and depth of NiCr/NiSi thin films were analyzed by means of Electron Probe, SEM, AFM, step profiler and stereo vision micro operation system. The results showed that NiCr/NiSi thin-films were small depth, uniform compact, smooth and good continuity, composition of which was close to target.
Yingxue Yao, Dunwen Zuo and Xipeng Xu
Y. X. Cui et al., "Fabrication and Characterization of NiCr/NiSi Functional Thin Films on Temperature Measurement of Cutter Sensor", Key Engineering Materials, Vols. 431-432, pp. 535-538, 2010