Fabrication and Characterization of NiCr/NiSi Functional Thin Films on Temperature Measurement of Cutter Sensor

Abstract:

NiCr/NiSi functional thin films of temperature measurement of cutter sensor were prepared by means of advanced Twinned microwave ECR plasma source enhanced Radio Frequency (RF) reaction non-balance magnetron sputtering technique. Fabrication technologies of NiCr/NiSi thin films were studied. The Compositions, micro-morphology, general structure and depth of NiCr/NiSi thin films were analyzed by means of Electron Probe, SEM, AFM, step profiler and stereo vision micro operation system. The results showed that NiCr/NiSi thin-films were small depth, uniform compact, smooth and good continuity, composition of which was close to target.

• Periodical: Key Engineering Materials (Volumes 431-432)
• Pages: 535-538
• DOI: https://doi.org/10.4028/www.scientific.net/KEM.431-432.535
• Online since: March 2010
• Authors: Yun Xian Cui, De Shun Yang, Qi Yong Zeng, Bao Yuan Sun
• Keywords: Cutter, Functional Thin Film, Measurement Temperature Sensor, NiCr, NiSi

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