Oxygen Diffusion in SrTiO3 Thin Films - An Attempt to Measure Oxygen Diffusivity at Relatively Low Temperature

Daiki Ishii; Toshimasa Suzuki; Hiroshi Kishi; Isao Sakaguchi; Naoki Ohashi; Hajime Haneda

doi:10.4028/www.scientific.net/KEM.566.258

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HomeKey Engineering MaterialsKey Engineering Materials Vol. 566Oxygen Diffusion in SrTiO3 Thin Films - An Attempt...

Oxygen Diffusion in SrTiO₃ Thin Films - An Attempt to Measure Oxygen Diffusivity at Relatively Low Temperature

Abstract:

Oxygen diffusivity in strontium titanate films with intentional non-stoichiometry, Sr_1+xTi_1+yO_δ with (1+x)/(1+y) = 0.71.5, was studied to reveal degradation behavior of Sr_1+xTi_1+yO_δ films. In order to utilize isotope tracer diffusion measurement, so-called gas/solid exchange method using ¹⁸O₂ gas, at relatively low temperature, very thin YSZ layer deposited on top of Sr_1+xTi_1+yO_δ film was used as catalyst for enhanced ¹⁸O[gas]/¹⁶O[solid] exchange at lower temperature. As a result, very high oxygen diffusivity at 673 K in Sr_1+xTi_1+yO_δ films with (1+x)/(1+y)>>1 was observed.

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Periodical:

Key Engineering Materials (Volume 566)

Pages:

258-261

DOI:

https://doi.org/10.4028/www.scientific.net/KEM.566.258

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Online since:

July 2013

Authors:

Daiki Ishii, Toshimasa Suzuki, Hiroshi Kishi, Isao Sakaguchi, Naoki Ohashi, Hajime Haneda

Keywords:

Catalyst, Non-Stoichiometry, Oxygen Diffusivity, Solid-Gas Exchange, SrTiO₃, Surface Reaction, Thin Film

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