Fabrication of Si Nanowire Biosensor Using FIB and its Evaluations

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We demonstrated the fabrication of silicon nanowire (SiNW) sensors by focused ion beam (FIB) method and determined the effects of changes of nanowire parameters of width and wire-number on the SiNW electrical property. SiNW sensors were fabricated on a silicon-on-insulator (SOI) wafer with Au-Cr electrodes by the FIB method. We fabricated the SiNW sensor with a minimum width of 90 nm, length of 20 μm and height of 60 nm. The I-V characteristics in the state of ohmic contact were obtained, and the SiNW resistance was found to have 0.86 MΩ and a resistivity of 0.02 Ωcm. In addition, the electrical resistance dependence on width and wire-number was investigated. We found that wire conductance could be increased by increasing the wire-number and wire width.

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224-228

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December 2013

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© 2014 Trans Tech Publications Ltd. All Rights Reserved

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