Evolution of TiN Coating Surface Roughness during Physical Vapor Deposition on High Speed Steel Substrate

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Abstract:

TiN coatings with different thickness were prepared by arc ion plating (AIP) physical vapor deposition (PVD) on high speed steel (HSS) substrates. TiN coatings surface roughness was investigated by atomic force microscopy (AFM) and 3D optical profilometry and growth kinetics was described using scaling exponents β and α. The growth exponent β is 0.91-1.0 and the roughness exponent α is 0.77-0.81. Due to relatively high value of the exponent α, the surface diffusion is likely predominant smoothening mechanism of TiN growth.

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67-70

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March 2014

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© 2014 Trans Tech Publications Ltd. All Rights Reserved

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[1] M. -H. Shiao, F. -S. Shieu, A formation mechanism for the macroparticles in arc ion-plated TiN films, Thin Solid Films 363 (2001) 27-31.

DOI: 10.1016/s0040-6090(00)01918-0

Google Scholar

[2] A. -L. Barabasi and H.E. Stanley, Fractal Concepts in Surface Growth, Cambridge University Press, Cambridge, (1995).

Google Scholar

[3] W.M. Tong, R.S. Williams, A. Yanase, Y. Segawa, and M.S. Anderson, Atomic Force Microscope Study of Growth Kinetics: Scaling in the Heteroepitaxy of CuCI on CaF2(111), Phys. Rev. Lett. 72(21) (1994) 3374-3378.

DOI: 10.1103/physrevlett.72.3374

Google Scholar

[4] J. Krim, I. Heyvaert, C. Van Haesendonck, and Y. Bruynseraede, Scanning Tunneling Microscopy Observation of Self-Affine Fractal Roughness in Ion-Bombarded Film Surfaces, Phys. Rev. Lett. 70(1) (1993) 57-62.

DOI: 10.1103/physrevlett.70.57

Google Scholar

[5] G. Palasantzas, J. Krim, Scanning Tunneling Microscopy Study of the Thick Film Limit of Kinetic Roughening, Phys. Rev. Lett. 73(26) (1994) 3564-3568.

DOI: 10.1103/physrevlett.73.3564

Google Scholar