Effect of SnCl4 Concentration on Transparent and Conducting Undoped Tin Oxide Thin Films

S. Tipawan Khlayboonme; Pitiporn Thanomngam; Warawoot Thowladda

doi:10.4028/www.scientific.net/KEM.690.246

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HomeKey Engineering MaterialsKey Engineering Materials Vol. 690Effect of SnCl4 Concentration on Transparent and...

Effect of SnCl₄ Concentration on Transparent and Conducting Undoped Tin Oxide Thin Films

Abstract:

The purpose-built pyrolysis system based on an ultrasonically generated aerosol has been successfully used for deposition of highly transparent and conductive undoped tin (IV) oxide thin films. The morphological, structural, optical and electrical properties as well as electronic structures of the films for different concentrations of SnCl₄.5H₂O used as the starting precursor were investigated. FE-SEM displayed the substrate surfaces were uniformly covered with the film. The film thickness varied with the precursor concentration. XRD patterns showed the deposited films were a tetragonal phase and presented random orientations. The optical transmission spectra of all films revealed highly transmittance in the visible region. Refractive index of the films was between 1.85 and 2.0. XPS spectra for the Sn 3d_5/2 and Sn 3d_3/2confirmed that the films were composed of SnO and SnO₂ phases. The non-stoichiometric composition decreased with increasing concentration of the precursor. The films deposited with 0.30 M showed the highest conductivity and carrier concentration of 17 W^-1cm^-1 and 9.5 x 10¹⁹ cm^-3, respectively. The disagreement of relation between XPS and Hall measurement suggested the higher carrier concentration arose from incorporation of residual chlorine from the solution precursor during deposition into the films. The interstitially incorporated chlorine considerably influenced the electrical properties of the films.

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Key Engineering Materials (Volume 690)

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246-251

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https://doi.org/10.4028/www.scientific.net/KEM.690.246

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Online since:

May 2016

Authors:

S. Tipawan Khlayboonme*, Pitiporn Thanomngam, Warawoot Thowladda

Keywords:

Hall Effect Measurement, TiN Oxide, Ultrasonic Aerosol Pyrolysis, XPS

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