Deep Wet Etching Uniformity of Polished Fused Silica Glass

Xiu Rong Du; Xue Fu Song; Yuan Cheng Sun; Xiao Qiang Zhang; Hui Wang; Xiao Hui Yang

doi:10.4028/www.scientific.net/KEM.726.404

Paper Titles

Microstructural Study on the Low Density SiO₂ Soot Body
p.383

Glass Surface Stress Measurement and Digitalization
p.388

Properties Characterization of MgO-Cr₂O₃-ZrO₂ Brick Prepared by Vacuum Impregnation
p.394

Effects of Sintering Temperature on Phases, Microstructures and Properties of Fused Silica Ceramics
p.399

Deep Wet Etching Uniformity of Polished Fused Silica Glass
p.404

Influence of Ionizing Gas Flow on Structural Homogeneity of Type IV Silica Glass
p.409

Analysis of the Test Method of Quartz Glass Optical Homogeneity
p.414

Test and Analysis of Hydroxyl Group in CVD Synthetic Silica Glass
p.419

Flame Temperature Distribution and SiO₂ Particles Distribution in Oxyhydrogen Flame
p.424

HomeKey Engineering MaterialsKey Engineering Materials Vol. 726Deep Wet Etching Uniformity of Polished Fused...

Deep Wet Etching Uniformity of Polished Fused Silica Glass

Abstract:

Deep wet etching for polished fused silica glass in HF solutions was investigated to manufacture quartz pendulous reed with better surface quality and higher size precision. It is widely believed that etching rate was mostly decided by the temperature and concentration of HF solutions. But, in the beginning it was found difficult to control the uniformity of etching depth when the glass was etched for 0.3 ~ 0.5 mm each side. Now, it is detected with help from new designed etching machine that depth of 0.5mm or more can be achieved very easily. And the uniformity about ±0.002 mm would also be realized easily by keeping the sample glass at same depth and moving all the time in HF solution with the temperature and concentration are 45°C and 40% HF

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Periodical:

Key Engineering Materials (Volume 726)

Pages:

404-408

DOI:

https://doi.org/10.4028/www.scientific.net/KEM.726.404

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Online since:

January 2017

Authors:

Xiu Rong Du, Xue Fu Song, Yuan Cheng Sun, Xiao Qiang Zhang, Hui Wang, Xiao Hui Yang

Keywords:

Fused Silica Glass, HF Solution, Uniformity of Etching Depth, Wet Etching

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