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Influence of Annealing Temperature on the Properties of Sol-Gel Deposited Nb-Doped TiO2 Thin Films

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Abstract:

Nb-doped TiO2 (TNO) thin films were prepared by a sol-gel spin coating method with Nb content of 5 at.%, and then annealed in the temperature range of 500-900 °C. The surface morphologies and the crystalline phases of the TNO thin films were investigated by using SEM and XRD patterns. The grain sizes increased with rising annealing temperature, and the crystalline phases were completely transformed from anatase into rutile when the annealing temperature was above 900 °C in air atmosphere. In addition, the optical band gap decreased and the average optical transmittance was between 75 and 70 % in the range of visible light. Furthermore, the better electrical properties were obtained at the annealing temperature of 600 °C.

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Periodical:

Key Engineering Materials (Volume 845)

Pages:

59-64

DOI:

https://doi.org/10.4028/www.scientific.net/KEM.845.59

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Online since:

May 2020

Authors:

Wen Cheng Tzou*, Hon Kuan, You Cheng Chang

Keywords:

Annealing, Crystalline Phases, Nb-Doped TiO2, Sol-Gel

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© 2020 Trans Tech Publications Ltd. All Rights Reserved

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