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HomeKey Engineering MaterialsKey Engineering Materials Vols. 89-91Ultramicrohardness Measurement of Silicon Nitride...

Ultramicrohardness Measurement of Silicon Nitride Films

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Silicon Nitride '93

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Periodical:

Key Engineering Materials (Volumes 89-91)

Pages:

547-552

DOI:

https://doi.org/10.4028/www.scientific.net/KEM.89-91.547

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Online since:

August 1993

Authors:

X. Cai, Jian Fei Wang, P.N. Zhou, X.H. Liu, Z. Zhen

Keywords:

Critical Test Load, Folm Thickness, Ion Beam Enhanced Deposition, Silicon Nitride Films, Substrate Contribution, Ultramicrohardness Measurements

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© 1994 Trans Tech Publications Ltd. All Rights Reserved

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