Plasma Characteristics Related to Thin-Film Microstructures in Unbalanced Magnetron Sputtering Processes

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Periodical:

Materials Science Forum (Volumes 102-104)

Edited by:

E.J. Mittemeijer

Pages:

563-572

DOI:

10.4028/www.scientific.net/MSF.102-104.563

Citation:

S.L. Rohde "Plasma Characteristics Related to Thin-Film Microstructures in Unbalanced Magnetron Sputtering Processes ", Materials Science Forum, Vols. 102-104, pp. 563-572, 1992

Online since:

January 1992

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$35.00

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