Electron-Positron-Channeling and Mössbauer-Effect Studies of Indium-Vacancy Complexes in Ion-Implanted Nickel

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Periodical:

Materials Science Forum (Volumes 15-18)

Edited by:

C. Abromeit and H. Wollenberger

Pages:

665-668

DOI:

10.4028/www.scientific.net/MSF.15-18.665

Citation:

B. Besold et al., "Electron-Positron-Channeling and Mössbauer-Effect Studies of Indium-Vacancy Complexes in Ion-Implanted Nickel", Materials Science Forum, Vols. 15-18, pp. 665-668, 1987

Online since:

January 1987

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