Interlamellar Spacing in Al-Si Eutectic Growth Controlled by Temperature Gradient

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Periodical:

Materials Science Forum (Volumes 215-216)

Edited by:

A. Roósz and M. Rettenmayr

Pages:

323-330

Citation:

W. Wołczyński et al., "Interlamellar Spacing in Al-Si Eutectic Growth Controlled by Temperature Gradient", Materials Science Forum, Vols. 215-216, pp. 323-330, 1996

Online since:

June 1996

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