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HomeMaterials Science ForumMaterials Science Forum Vols. 347-349Stress in Poly-SiC Films Grown by Low Pressure CVD

Stress in Poly-SiC Films Grown by Low Pressure CVD

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Residual Stress ECRS 5

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Periodical:

Materials Science Forum (Volumes 347-349)

Pages:

477-485

DOI:

https://doi.org/10.4028/www.scientific.net/MSF.347-349.477

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Online since:

May 2000

Authors:

J. Rodríguez-Viejo, E. Hurtós, R. Kressmann, Maria T. Clavaguera-Mora

Keywords:

Chemical Vapor Deposition (CVD), Poly-SiC, Stress, Thin Film, X-Ray Diffraction (XRD)

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© 2000 Trans Tech Publications Ltd. All Rights Reserved

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