Fabrication of Thin Film Using Nanosized Indium Tin Oxide (ITO) Powder and Its Degradation Characteristics

Kim, Yong Nam; Park, Jeong Hyun; Shin, Hyun Gyu; Song, Jun Kwang; Lee, Hee Soo

doi:10.4028/www.scientific.net/MSF.449-452.285

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Home Materials Science Forum Designing, Processing and Properties of Advanced...Fabrication of Thin Film Using Nanosized Indium...

Fabrication of Thin Film Using Nanosized Indium Tin Oxide (ITO) Powder and Its Degradation Characteristics

Abstract:

Nanosized ITO powder was fabricated by homogeneous precipitation which used formamide as a precipitator. ITO thin film was deposited by RF magnetron sputtering using ITO target which was prepared by sintering of nanosized ITO powder. From the accelerated degradation test with stress factor of temperature, the lifetime estimate, degradation rate/degree, activation energy and etc. were calculated. It was showed that under thermal condition, the prominent failure mechanism of degradation was the decrease of oxygen vacancies due to oxidation of ITO thin film.

Info:

Periodical:

Materials Science Forum (Volumes 449-452)

Main Theme:

Designing, Processing and Properties of Advanced Engineering Materials

Edited by:

S.-G. Kang and T. Kobayashi

Pages:

285-288

DOI:

10.4028/www.scientific.net/MSF.449-452.285

Citation:

Y. N. Kim et al., "Fabrication of Thin Film Using Nanosized Indium Tin Oxide (ITO) Powder and Its Degradation Characteristics", Materials Science Forum, Vols. 449-452, pp. 285-288, 2004

Online since:

March 2004

Authors:

Yong Nam Kim, Jeong Hyun Park, Hyun Gyu Shin, Jun Kwang Song, Hee Soo Lee

Keywords:

Accelerated Degradation, Activation Energy, Lifetime, Nanosized ITO Powder, Oxygen Vacancy, Reaction Rate, Thin Film

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