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Growth Strains and Stress Relaxation in Alumina Scales during High Temperature Oxidation

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Periodical:

Materials Science Forum (Volumes 461-464)

Pages:

671-680

DOI:

https://doi.org/10.4028/www.scientific.net/MSF.461-464.671

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Online since:

August 2004

Authors:

Peggy Y. Hou, A.P. Paulikas, B.W. Veal

Keywords:

Al2O3, Debye-Sherrer Diffraction, FeAl, FeCrAl, Growth Stress, NiAl, Oxidation, Reactive Element (RE), Synchrotron Radiation (XRD), X-Ray

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© 2004 Trans Tech Publications Ltd. All Rights Reserved

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