Effect of Solution Chemistry and Electroplating Conditions on the Deposition Rate and Wear Resistance of Eco-Friendly Trivalent Chromium Layers

Abstract:

Article Preview

Chromium chloride (CrCl3) or chromium sulfate(Cr2(SO4)3) content increased trivalent chrome deposition rate. The addition of formic acid and the relative content change of potassium hydroxide decreased the trivalent chrome deposition rate. Industrially applicable trivalent chromium layers with more than 200 µm thick were well prepared at the conditions of pH with the range of 1.3-1.8, electrical current density of 5.0-5.6 A/cm2 and applied voltage of 4.0-5.9V. Average microhardnesses of the chromium layers prepared in the chromium chloride and chromium sulfate solutions are about 803-820 and 700-712 Hv, respectivevly. The wear resistance of the trivalent chromium layers was improved by plating voltage which was related to residual compressive stress on the chomium layer.

Info:

Periodical:

Materials Science Forum (Volumes 475-479)

Main Theme:

Edited by:

Z.Y. Zhong, H. Saka, T.H. Kim, E.A. Holm, Y.F. Han and X.S. Xie

Pages:

4005-4008

DOI:

10.4028/www.scientific.net/MSF.475-479.4005

Citation:

M. Y. Choi et al., "Effect of Solution Chemistry and Electroplating Conditions on the Deposition Rate and Wear Resistance of Eco-Friendly Trivalent Chromium Layers ", Materials Science Forum, Vols. 475-479, pp. 4005-4008, 2005

Online since:

January 2005

Export:

Price:

$35.00

In order to see related information, you need to Login.

In order to see related information, you need to Login.