Nitride Formation on Titanium under Irradiation of Intense Pulsed Ion Beam

X.P. Zhu; Tsuneo Suzuki; Hisayuki Suematsu; Wei Hua Jiang; Koichi Niihara

doi:10.4028/www.scientific.net/MSF.510-511.17

Paper Titles

Fabrication of Photocatalytic TiO₂ Thin Film Using Innovative Aerosol Deposition Method
p.1

Titanium Oxide-Based Photocatalysts: -From Fundamentals to Practical Applications-
p.5

Design of Efficient TiO₂/SiC Photocatalysts from TiC-SiC Nano Particles for Degradation of Organic Pollutants Diluted in Water
p.9

Bioactivity of Plasma-Sprayed TiO₂ Coating in Simulated Body Fluid by Hydrofluoric Acid Treatment
p.13

Nitride Formation on Titanium under Irradiation of Intense Pulsed Ion Beam
p.17

VOC Decomposition by Photocatalytic Wall Paper
p.22

Photo-Decomposition Property of Thermal Sprayed TiO₂ Coatings
p.26

Hydrogen Production by Catalytic Decomposition of Methane over Carbon Nanofibers
p.30

Photocatalytic Oxidation and Decomposition of Acetic Acid over TiO₂, TS-1 and Ti-MCM-41 Catalysts
p.34

HomeMaterials Science ForumMaterials Science Forum Vols. 510-511Nitride Formation on Titanium under Irradiation of...

Nitride Formation on Titanium under Irradiation of Intense Pulsed Ion Beam

Abstract:

Nitriding of titanium was achieved in a vacuum of ~2×10-2 Pa by applying intense pulsed ion beam (IPIB) irradiation. Various phases including ‘pure’ nitrides (e.g. Ti2N, TiN) as well as carbonitrides (e.g. TiC0.3N0.7) were found on the IPIB-irradiated surfaces that depended on the ion beam intensity, shot number, and sample position with respect to the ion beam axis. It was found that the nitrides were preferably produced at moderate beam intensity by which the nitriding depth increased greatly with multi-shot irradiation. No or less nitrides were produced under irradiation of very high intensity or less number of shots. It is demonstrated that the IPIB nitriding process is very efficient even in vacuum where the residual N2 can readily react with melted Ti surfaces under IPIB irradiation. The origin of incorporated C in the nitrides is mainly attributed to the anode material of ion diode used in the IPIB apparatus.

You might also be interested in these eBooks

View Preview

Info:

Periodical:

Materials Science Forum (Volumes 510-511)

Pages:

17-21

DOI:

https://doi.org/10.4028/www.scientific.net/MSF.510-511.17

Citation:

Cite this paper

Online since:

March 2006

Authors:

X.P. Zhu, Tsuneo Suzuki, Hisayuki Suematsu, Wei Hua Jiang, Koichi Niihara

Keywords:

Intense Pulsed Ion Beam, Nitriding, Surface Modification, Ti Carbonitride, Ti Nitride

Export:

RIS, BibTeX

Price:

Permissions CCC:

Request Permissions

Permissions PLS:

Request Permissions

Сopyright:

Citation:

References

[1] X. Liu, P.K. Chu and C. Ding: Mater. Sci. Eng. R Vol. 47 (2004), p.49.

Google Scholar

[2] Y.S. Tian, C.Z. Chen, S.T. Li and Q.H. Huo: Appl. Surf. Sci. Vol. 242 (2005) p.177.

Google Scholar

[3] E. Gyorgy, A. Perez del Pino, P. Serra and J. L. Morenza: Appl. Surf. Sci. Vol. 186 (2002) p.130.

Google Scholar

[4] P. Schaaf, M. Han, K. -P. Lieb and E. Carpene: Appl. Phys. Lett. Vol. 80 (2002) p.1091.

Google Scholar

[5] X.P. Zhu, H. Suematsu, W. Jiang, K. Yatsui and M.K. Lei: Appl. Phys. Lett. (in press).

Google Scholar

[6] X.P. Zhu, T. Yukawa, M. Hirai, T. Suzuki, H. Suematsu, W. Jiang and K. Yatsui: Appl. Surf. Sci. Vol. 242 (2005) p.256.

Google Scholar

[7] S.M. Miao, X.P. Zhu and M.K. Lei: Nucl. Instrum. Methods Phys. Res. B Vol. 229 (2005) p.381.

Google Scholar

[8] B.D. Cullity and S.R. Stock: Elements of X-Ray Diffraction (Third Edition, Prentice Hall, New Jersey, USA, 2001).

Google Scholar

[9] K. Yatsui, C. Grigoriu, H. Kubo, K. Masugata and Y. Shimotori: Appl. Phys. Lett. Vol. 67 (1995) p.1214.

DOI: 10.1063/1.115011

Google Scholar

[10] E. Carpene and P. Schaaf: Appl. Phys. Lett. Vol. 80 (2002) p.891.

Google Scholar

[11] J.M. Lackner: Vacuum Vol. 78 (2005) p.73.

Google Scholar

[12] J.H. Hsieh, W. Wu, C. Li, C.H. Yu and B.H. Tan: Surf. Coat. Technol. Vol. 163-164 (2003) p.233.

Google Scholar