OH Diffusion - on the Measurement of Concentration Profiles in Doped MCVD-Silica Layers Using a Color Center Laser

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Periodical:

Materials Science Forum (Volumes 62-64)

Edited by:

J. Barthel et al.

Pages:

821-822

DOI:

10.4028/www.scientific.net/MSF.62-64.821

Citation:

G. Braun et al., "OH Diffusion - on the Measurement of Concentration Profiles in Doped MCVD-Silica Layers Using a Color Center Laser", Materials Science Forum, Vols. 62-64, pp. 821-822, 1991

Online since:

January 1991

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$35.00

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