Approach to Optimum Layer Structure of Functionally Graded Materials

Kazuhiro Hasezaki; Yasutoshi Noda

doi:10.4028/www.scientific.net/MSF.631-632.29

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HomeMaterials Science ForumMaterials Science Forum Vols. 631-632Approach to Optimum Layer Structure of...

Approach to Optimum Layer Structure of Functionally Graded Materials

Abstract:

Minimum interlayer numbers of functionally graded materials (FGMs) are studied based on the empirical analysis of thermal stress due to the differences in the thermal expansion coefficient  and temperature T between sintering and room temperatures. It is found the maximum ,   and the minimum interlayer number necessary to produce a NiCr / Fly ash FGM structure without interface cracking were 4.0×10-6 K-1, 1080 K, 0.043 and 2, respectively. The condition  < 0.043 was derived and confirmed to be valid for available FGM systems.

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Materials Science Forum (Volumes 631-632)

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29-34

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https://doi.org/10.4028/www.scientific.net/MSF.631-632.29

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Online since:

October 2009

Authors:

Kazuhiro Hasezaki, Yasutoshi Noda

Keywords:

Functionally Graded Material (FGM), Spark Plasma Sintering (SPS), Thermal Expansion Coefficient, Thermal Stress

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