Thermodynamic Study of Annealing Process of Si-Implanted GaAs

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Periodical:

Materials Science Forum (Volumes 65-66)

Edited by:

Gordon Davies

Pages:

421-426

DOI:

10.4028/www.scientific.net/MSF.65-66.421

Citation:

M. Ichimura et al., "Thermodynamic Study of Annealing Process of Si-Implanted GaAs", Materials Science Forum, Vols. 65-66, pp. 421-426, 1991

Online since:

January 1991

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Price:

$35.00

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