A Study on the Characteristics of the Polycrystalline Silicon Annealed by the SHG Nd:YAG Laser

Young Chul Kim; Dae Wook Kim; Ho Seob Kim; Seong Joon Ahn; Seung Joon Ahn

doi:10.4028/www.scientific.net/MSF.695.9

Paper Titles

Preface, Organizing Committee and Sponsors

Barium-Free Glass-Ceramic Sealants from the System CaO-MgO-B₂O₃-Al₂O₃-SiO₂ for Application in the SOFC
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Fuel Gases from Gasification Process of Glass Fiber/Epoxy Composite Waste
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A Study on the Characteristics of the Polycrystalline Silicon Annealed by the SHG Nd:YAG Laser
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Adsorption Mechanism of Copper(II) Ions on Expansion-Treated Rice Husk
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Photoemission and Energy Gap of CdS Synthesized by Solid State Microwave-Plasma
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Effects of Annealing Conditions on Morphology and Permeability of Palladium Membrane
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Fixed-Bed Column Study for Zn (II) Removal from Solution Using Expanding Rice Husk
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HomeMaterials Science ForumMaterials Science Forum Vol. 695A Study on the Characteristics of the...

A Study on the Characteristics of the Polycrystalline Silicon Annealed by the SHG Nd:YAG Laser

Abstract:

We have annealed the thin layer of the amorphous silicon (a-Si) using the Q-swtiched Nd:YAG laser pulses in order to transform the a-Si into polycrystalline silicon (poly-Si) and investigated the crystalline structures of the poly-Si. Before illuminating the light to the layer, the frequency of the laser was doubled through the second harmonic generation (SHG) process to enhance the absorption efficiency of the optical energy. When the optical energy was higher than 500 mJ/cm², we could obtain the micro-crystalline structure with grain size as large as 500 nm.

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Periodical:

Materials Science Forum (Volume 695)

Pages:

9-12

DOI:

https://doi.org/10.4028/www.scientific.net/MSF.695.9

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Online since:

July 2011

Authors:

Young Chul Kim, Dae Wook Kim, Ho Seob Kim, Seong Joon Ahn, Seung Joon Ahn

Keywords:

Amorphous, Energy Density, Laser Annealing, Micro-Crystalline Structure, Polycrystalline Silicon, Second Harmonic Generation

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