Coatings of Ti and TiO2 with Defined Roughness for Implants by Gas Flow Sputtering

Article Preview

Abstract:

High rate film deposition via Gas Flow Sputtering was used to develop both metallic titanium films and ceramic titania coatings for implants. The structure formation of the coatings can be described by a modified model of structure zones according to Thornton. The potential of Gas Flow Sputtering for designing implant surfaces with controlled morphology and roughness is demonstrated.

You might also be interested in these eBooks

Info:

Periodical:

Materials Science Forum (Volumes 706-709)

Pages:

443-448

Citation:

Online since:

January 2012

Export:

Price:

Permissions CCC:

Permissions PLS:

Сopyright:

© 2012 Trans Tech Publications Ltd. All Rights Reserved

Share:

Citation:

[1] X. Zhu, J. Chen, L. Scheideler, T. Altebaeumer, J. Geis-Gerstorfer, and D. Kern: Cells Tissues Organs, 178, 13-22 (2004).

DOI: 10.1159/000081089

Google Scholar

[2] K. Ortner, M. Birkholz, and Th. Jung: Vakuum in Forschung und Praxis, 15, Nr. 5, 236-239 (2003).

Google Scholar

[3] H. Jacobsen, H. -J. Quenzer, B. Wagner, K. Ortner, and Th. Jung: Sensors and Actuators, A 135, 23-27 (2007).

DOI: 10.1016/j.sna.2006.10.011

Google Scholar

[4] M. Peters, Ch. Leyens, and J Kumpfert (Eds. ): Titan und Titanlegierungen, 2. Edition, p.5, Werkstoff-Informationsgesellschaft mbH, Frankfurt (1998).

DOI: 10.1002/9783527611089.ch1

Google Scholar

[5] J. A. Thornton: Ann. Rev. Mater. Sci., 7, 239-260 (1977).

Google Scholar

[6] R. Messier, A.P. Giri, and R.A. Roy: J. Vac. Sci. Technol., A 2 (2), 500-503 (1984).

Google Scholar