[1]
Park, J. H., et al. (2015). Reduction of RESET current in phase change memory devices by carbon doping in GeSbTe films., Journal of Applied Physics 117(11): 115703.
DOI: 10.1063/1.4914909
Google Scholar
[2]
Hamann, Hendrik F., et al. Ultra-high-density phase-change storage and memory., Nature materials 5. 5 (2006): 383-387.
Google Scholar
[3]
Siegrist, T., et al. Disorder-induced localization in crystalline phase-change materials., Nature materials 10. 3 (2011): 202-208.
Google Scholar
[4]
Simpson, R. E., et al. Toward the ultimate limit of phase change in Ge2Sb2Te5., Nano letters 10. 2 (2009): 414-419.
Google Scholar
[5]
Friedrich, I., V. Weidenhof, W. Njoroge, P. Franz, and M. Wutting. Structural transformations of Ge2Sb2Te5 films studied by electrical resistance measurements., Journal of Applied Physics 87, no. 9; PART 1 (2000): 4130-4134.
DOI: 10.1063/1.373041
Google Scholar
[6]
Zhou, Xilin, Mengjiao Xia, Feng Rao, Liangcai Wu, Xianbin Li, Zhitang Song, Songlin Feng, and Hongbo Sun. Understanding phase-change behaviors of carbon-doped Ge2Sb2Te5 for phase-change memory application., ACS applied materials & interfaces 6, no. 16 (2014).
DOI: 10.1021/am503502q
Google Scholar
[7]
Zhou, Xilin, Liangcai Wu, Zhitang Song, Feng Rao, Min Zhu, Cheng Peng, Dongning Yao, Sannian Song, Bo Liu, and Songlin Feng. carbon-doped Ge2Sb2Te5 phase change material: A candidate for high-density phase change memory application., Applied Physics Letters 101, no. 14 (2012).
DOI: 10.1063/1.4757137
Google Scholar
[8]
Borisenko, Konstantin B., Yixin Chen, David JH Cockayne, Se Ahn Song, and Hong Sik Jeong. Understanding atomic structures of amorphous C-doped Ge 2 Sb 2 Te 5 phase-change memory materials., Acta Materialia 59, no. 11 (2011): 4335-4342.
DOI: 10.1016/j.actamat.2011.03.057
Google Scholar
[9]
Zhou, Wangyang, Liangcai Wu, Xilin Zhou, Feng Rao, Zhitang Song, Dongning Yao, Weijun Yin et al. High thermal stability and low density variation of carbon-doped Ge2Sb2Te5 for phase-change memory application., Applied Physics Letters 105, no. 24 (2014).
DOI: 10.1063/1.4904832
Google Scholar
[10]
Kim, I. S. et al. High performance PRAM cell scalable to sub-20 nm technology with below 4F2 cell size, extendable to DRAM applications. Symp. on VLSI Tech. Dig. 203–204 (Honolulu, 2010).
DOI: 10.1109/vlsit.2010.5556228
Google Scholar
[11]
Cheong, Byung-ki, et al. Fast and scalable memory characteristics of Ge-doped SbTe phase change materials., physica status solidi (b) 249. 10 (2012): 1985-(1991).
DOI: 10.1002/pssb.201200419
Google Scholar