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Online since: June 2013
Authors: Xiao Li Wen
The advantages of virtual manufacturing technology for firms are the increase in productivity, flexibility, quality, reduction in design time and work in progress .The strategic improvement model, as given in Fig.2, shows that the different cluster of strategic inputs leads enterprise flexibility towards leanness and agility [4].
Fig. 1 Structure evolution of VE Fig. 2 Strategy evolution of VE The Impact of Virtual Manufacturing on Corporation Management Benefits of virtual manufacturing include:(a)direct impact on productivity of designers; (b)dramatically improve manufacturing design responsiveness; (c)improve confidence in designs through better communication and understanding; (d)improving team communication and understanding; (e)leverage investment in models of product, tooling and layout data; (f)reduce unnecessary re-work costs; (g)improve worker safety and efficiency; (9)reduce time to launch[7].On the other hand,corporation management is a process trying to control and regulate man-resource,material-resource and financilal capacity through information.Along with the development of virtual manufacturing technology,coporationg management must be improved.
Fig. 1 Structure evolution of VE Fig. 2 Strategy evolution of VE The Impact of Virtual Manufacturing on Corporation Management Benefits of virtual manufacturing include:(a)direct impact on productivity of designers; (b)dramatically improve manufacturing design responsiveness; (c)improve confidence in designs through better communication and understanding; (d)improving team communication and understanding; (e)leverage investment in models of product, tooling and layout data; (f)reduce unnecessary re-work costs; (g)improve worker safety and efficiency; (9)reduce time to launch[7].On the other hand,corporation management is a process trying to control and regulate man-resource,material-resource and financilal capacity through information.Along with the development of virtual manufacturing technology,coporationg management must be improved.
Online since: October 2014
Authors: Li Guo, Wen Ding, Xiao Li Li, Ji Ping Yu
In order to investigate the mechanism of adsorption process, three kinetic models were applied to fit the transient state experimental data, the pseudo-first-order model, the pseudo-second-order model and the intraparticle diffusion model.
The difference of adsorption capacities to BPA on three TiO2 nanoparticles is due to the inclusion of β-CD for BPA and the reduction of adsorption site for BPA on TiO2-S1 surface because of S1 counteract.
The difference of adsorption capacities to BPA on three TiO2 nanoparticles is due to the inclusion of β-CD for BPA and the reduction of adsorption site for BPA on TiO2-S1 surface because of S1 counteract.
Online since: October 2009
Authors: Yuan Zhang, Shao Chen Kang, Shi Wei Yin, Peng Wang
Introduction
The new characteristics of mechanical manufacturing industry are the variational market demand,
the shortening products upgrade cycle, variety specification increasing, batch reduction, sustainable
development etc.
The common method such as simulation annealing and genetic algorithm those are difficult to use in multidimensional data, control convergence and with lower efficiency.
The common method such as simulation annealing and genetic algorithm those are difficult to use in multidimensional data, control convergence and with lower efficiency.
Online since: June 2010
Authors: Stefan Gulizia, Mahnaz Z. Jahedi, A. Trentin, S. Vezzù, Silvano Rech, Peter King, Mario Guagliano
Therefore the residual stress was calculated as the mean value of the whole
dataset without considering the data from the surface.
The highest porosity reduction occurred at a gas temperature of 400°C.
The highest porosity reduction occurred at a gas temperature of 400°C.
Online since: April 2010
Authors: Jacek M. Baranowski, Jolanta Borysiuk, Wlodek Strupiński, Aneta Drabińska
Experimental Data
Graphene epitaxy.
Since the reflectance of the graphene mono-layer is of the order of 10 −5 [10], it can be neglected and all the showed reduction come from the absorption of light by graphene.
Since the reflectance of the graphene mono-layer is of the order of 10 −5 [10], it can be neglected and all the showed reduction come from the absorption of light by graphene.
Online since: October 2010
Authors: Guang Dai, Xu Chi, Hai Long Fu, Long Qing Zou
The absolute transmissibility of system is ηA.
2
2
2
0 )(2)-(1
)(21
ξλλ ξλ
η
+
+
== F
FT
A (2)
Where (2), A is displacement amplitude, λis the ratio of excitation frequency and natural
frequency, ξis the ratio of viscous damping coefficient and critical damping coefficient, and Aη is the
degree of reduction on force or vibration after isolating.
The test system equipments (Fig.3) includ TS1102/1100 acceleration sensors, TS3828 resistance strain instruments, UT3232S data acquisition and processing system, and notebook computer.
The test system equipments (Fig.3) includ TS1102/1100 acceleration sensors, TS3828 resistance strain instruments, UT3232S data acquisition and processing system, and notebook computer.
Online since: December 2006
Authors: Iswadi Jauhari, Raden Dadan Ramdan, Rafidah Hasan, Hiroyuki Ogiyama
Therefore, superplastic boronizing process can be certainly done on DSS as this will provide new data on boronizing as well as expand the application of DSS in industries.
This solution treated DSS was then coldrolled to a plate through a reduction area of 75%.
This solution treated DSS was then coldrolled to a plate through a reduction area of 75%.
Online since: October 2006
Authors: Mark J. Loboda, Michael J. Spaulding, Seung Ho Park
A threshold level is set which associates the pixel intensity to the degree of
birefringence believed to pose a potential reduction in device performance.
This value is assigned from statistic data through experiments with various wafers that have different value of birefringence defect free area (BDFA), because relatively lower threshold value can produce exaggerated birefringence pixels on birefringence-free area.
This value is assigned from statistic data through experiments with various wafers that have different value of birefringence defect free area (BDFA), because relatively lower threshold value can produce exaggerated birefringence pixels on birefringence-free area.