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Electrical Characterization and Microstructures of Tb-Doped Bi4Ti3O12 Thin Films
Abstract:
Tb-doped bismuth titanate (BixTbyTi3O12: BTT) and pure Bi4Ti3O12 (BIT) thin films with random orientation were fabricated on Pt/Ti/SiO2/Si substrates by rf magnetron sputtering technique. These samples had polycrystalline Bi-layered perovskite structure without preferred orientation, and consisted of well-developed rod-like grains with random orientation. Tb doping into BIT caused a large shift of the Curie temperature (TC) from 675°C to lower temperature. The experimental results indicated that Tb doping into BIT result in a remarkable improvement in dielectric property.
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82-84
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Online since:
February 2008
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© 2008 Trans Tech Publications Ltd. All Rights Reserved
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