Paper Titles
Computer Simulation for X-Ray Analysis of Nanostructured Cu Processed by Severe Plastic Deformation
p.99
The Microstructure of Mechanically Alloyed Nanocrystalline Aluminium-Magnesium
p.103
Approximate Estimation of Contributions to Pure X-Ray Diffraction Line Profiles from Crystallite Shapes, Sizes and Strains by Analysing Peak Widths
p.107
Study of Submicrocrystalline Materials by Conventional Powder Diffraction and Diffuse Scattering in Transmitted Wave
p.111
Thickness Determination of Thin Polycrystalline Films by Grazing Incidence X-Ray Diffraction
p.115
XRD Line Broadening Analysis with Ball Milled Palladium
p.119
Line Broadening Analysis Using FullProf*: Determination of Microstructural Properties
p.123
Line Profile Analysis (LPA) Methods: Systematic Ranking of the Quality of their Basic Assumptions
p.127
Applicability of the Crystallite Group Method to Fibre Textured Specimens
p.131

Thickness Determination of Thin Polycrystalline Films by Grazing Incidence X-Ray Diffraction

Article Preview

Abstract:

The thickness measurement based on absorption of X-rays in thin films has been tested on a polycrystalline titanium nitride films deposited on a tungsten carbide substrate. Intensities of three reflections from each material were measured for incidence angles of the primary beam ranging from 0.5° to 35°. After experimental correction for texture effects, data from the TiN film and the WC substrate were fitted by known functions using least squares routines. The substrate reflection intensities were found to be more suitable for determining the thickness of the overlaying thin film. The average thickness of TiN film (2.00± 0.17 µm) determined from the substrate reflections was in fair agreement with the average value obtained from optical microscopy (2.2± 0.8 µm). The thickness values determined from the TiN thin film reflections are very unreliable due to a high sensitivity of measurements to disturbing instrumental and sample effects at small angles.

You might also be interested in these eBooks
European Powder Diffraction EPDIC 8 View Preview

Info:

Periodical:

Materials Science Forum (Volumes 443-444)

Pages:

115-118

DOI:

https://doi.org/10.4028/www.scientific.net/MSF.443-444.115

Citation:

Cite this paper

Online since:

January 2004

Authors:

J. Lhotka, Radomír Kužel, G. Cappuccio, V. Valvoda

Keywords:

Thickness Determination, Titanium Nitride, X-Ray Diffraction (XRD)

Export:

RIS, BibTeX

Price:

Permissions CCC:

Request Permissions

Permissions PLS:

Request Permissions

Сopyright:

© 2004 Trans Tech Publications Ltd. All Rights Reserved

Share:

Citation:

References

[1] G.A. Battiston and R. Gerbasi, in Thin Film Characterization by Advanced X-ray Diffraction Techniques. Eds. G. Cappuccio and M. L. Terranova, INFN - LNF Report 96/049 (IR), Frascati 1996, p.225.

Google Scholar

[2] R. Kužel, R. Ierný, V. Valvoda, M. Blomberg and M. Merisalo: Thin Solid Films 247 (1994), p.64.

Google Scholar

[3] H.S. Peiser, H.P. Rooksby and A.J.C. Wilson: X-ray Diffraction by Polycrystalline Materials (Chapman & Hall Ltd., London 1960), p.159.

Google Scholar

[4] P.F. Fewster: X-ray Analysis of Thin Films and Multilayers, Rep. Prog. Phys. 59 (1996) p.1339.

DOI: 10.1088/0034-4885/59/11/001

Google Scholar