Paper Titles

Characterization of Laser-Irradiated Cd_xHg_1-xTe Solid Solutions by Scanning Microscopy Method
p.353

Scanning Acoustic Microscopes for the Investigation of Ferroelectric Properties of Materials
p.361

The Nature of the Electronic States of Cu₃Si-Precipitates in Silicon
p.369

TEM and Photoluminescence Investigations of InGaAs/GaAs Quantum Well Layers
p.375

The Assessment of Micro-Analytical Techniques to the Semiconductor Manufacturing Environment
p.383

Gate Oxide Defect Analysis Using Scanning Electron Microscopy (SEM)/Metal Oxide Semiconductor (MOS)/Electron Beam Induced Current (EBIC) with Sub-Nano Ampere Current Breakdown
p.395

Defect Characterization in Metal-Oxide-Semiconductor Field-Effect-Transistors with Trench Gates by Electron Beam-Induced Current Technique
p.407

Analysis of Non-Uniform Contamination Profiles by Lifetime Data
p.413

Scanning Photoluminescence for Wafer Characterization
p.421

HomeSolid State PhenomenaSolid State Phenomena Vols. 63-64The Assessment of Micro-Analytical Techniques to...

The Assessment of Micro-Analytical Techniques to the Semiconductor Manufacturing Environment

Article Preview

Abstract:

You might also be interested in these eBooks

Beam Injection Assessment of Defects in Semiconductors

Info:

Periodical:

Solid State Phenomena (Volumes 63-64)

Pages:

383-394

DOI:

https://doi.org/10.4028/www.scientific.net/SSP.63-64.383

Citation:

Cite this paper

Online since:

December 1998

Authors:

J.L Corbacho, A. Urquía, Asunción Fernández, G. Sánchez, M. Recio, V. Martín, F. Barbado, C. Morilla, A. Riloba, J. M. de la Hoz

Export:

RIS, BibTeX

Price:

Permissions CCC:

Request Permissions

Permissions PLS:

Request Permissions

Сopyright:

© 1998 Trans Tech Publications Ltd. All Rights Reserved

Share:

Citation: