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Characteristics of Indium Zinc Oxide Thin Films Deposited by Radio Frequency Reactive Magnetron Sputtering for Solar Cells Application

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Abstract:

Indium zinc oxide (IZO) thin films were deposited on a glass substrate by radio frequency (rf) reactive magnetron sputtering method. As the rf power increased, the deposition rate and resistivity increased while the optical transmittance decreased owing to the increase of grain size. With increasing gas pressure, the resistivity increased and the transmittance decreased. Atomic force microscopy and scanning electron microscopy were employed to observe the film surface. The IZO films displayed a resistivity of 3.8 × 10-4 Ω cm and a transmittance of about 90% in visible region.

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Periodical:

Solid State Phenomena (Volumes 124-126)

Pages:

999-1002

DOI:

https://doi.org/10.4028/www.scientific.net/SSP.124-126.999

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Online since:

June 2007

Authors:

Han Na Cho, Jang Woo Lee, Su Ryun Min, Chee Won Chung

Keywords:

Indium Zinc Oxide, Solar Cell, Sputtering, Transparent-Conductive Oxide

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© 2007 Trans Tech Publications Ltd. All Rights Reserved

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