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Articles by author: Chong Mu Lee

• A Comparison of the Mechanical Properties of RF- and DC- Sputter-Deposited Cr Thin Films
  Published in: Progress in Light Metals, Aerospace Materials and Superconductors (p1695)
• A Comparison of the Surface Properties of DLC and Nanocrystalline Diamond
  Published in: High-Performance Ceramics IV (p1776)
• A Simple Reliable Method of Selecting Epoxy Molding Compounds for High Power Short Wavelength Light Emitting Diode Packages
  Published in: Eco-Materials Processing & Design VII (p154)
• Crystallinity and Photoluminescence Properties of ZnO Films on Zn Buffer Layers Deposited by rf Magnetron Sputtering
  Published in: High-Performance Ceramics IV (p567)
• Dependence of Electrical and Optical Properties of the Al Doped ZnO for Transparent Conductors Deposited by rf–Magnetron Sputtering on the O₂/Ar Gas Flow Ratio
  Published in: High-Performance Ceramics IV (p564)
• Dependence of the Dielectric Properties of Pt/ZrO₂/Si Capacitors Prepared by RF-Magnetron Sputtering on the Oxygen Partial Pressure and the Annealing Temperature
  Published in: Eco-Materials Processing and Design VIII (p937)
• Dual Ion Beam Sputtering for Chromium Nitride as an Alternative to Electroplated Hexavalent Chromium
  Published in: Eco-Materials Processing & Design VI (p301)
• Effect of Thermo-Mechanical Variables on the Dynamic Ferrite Transformation Induced by Hot Deformation in 0.22C-Mn Steel
  Published in: Eco-Materials Processing & Design VII (p510)
• Effects of Annealing Atmosphere on the Optoelectrical Properties of ZnO Thin Films Grown by Atomic Layer Deposition
  Published in: Eco-Materials Processing & Design VII (p670)
• Effects of Post-Annealing on the Electrical and Optical Properties of ZnO Thin Films Grown on Al₂O₃ Substrates by Atomic Layer Epitaxy
  Published in: Eco-Materials Processing and Design VIII (p729)
• Electrical Properties of ZrO₂ Capacitor Dielectrics Deposited by rf Magnetron Sputtering
  Published in: Advances in Nanomaterials and Processing (p13)
• Enhancement of the Quality of the ZnO Thin Films by Optimizing the Process Parameters of High-Temperature RF Magnetron Sputtering
  Published in: High-Performance Ceramics IV (p581)
• Growth of Ga-Doped ZnO Bilayer by RF Magnetron Sputtering with Different Atmospheres
  Published in: Advances in Nanomaterials and Processing (p69)
• Pretreatment of the TaSiN Substrate Surface for Copper-MOCVD
  Published in: High-Performance Ceramics III (p911)
• Reactive Sputter Deposition of WC_x Films for Replacing Hexavalent Chromium
  Published in: Eco-Materials Processing & Design VI (p514)