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Articles by author: Harald Okorn-Schmidt

• Behaviour of a Well-Designed Megasonic Cleaning System
  Published in: Ultra Clean Processing of Silicon Surfaces VII (p155)
• Characterization of DI Water/O₃ Oxidation of Si (100) and Si (111) Surfaces by OCP Measurements
  Published in: Ultra Clean Processing of Silicon Surfaces V (p161)
• Electrophoretic Studies on Silicon Nitride: Traces of Silicates in UPW Shift Zeta Potential Similar to SC-1
  Published in: Ultra Clean Processing of Silicon Surfaces VII (p163)
• Open Circuit Potential Analysis as a Fast Screening Method for the Quality of High-k Dielectric Layers
  Published in: Ultra Clean Processing of Silicon Surfaces VI (p7)
• The Active Role of Etch Products in Particle Removal by SC-1 Solutions
  Published in: Ultra Clean Processing of Semiconductor Surfaces VIII (p181)