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Articles by author: Jeffrey M. Lauerhaas

• A Theoretical and Experimental Study of Damage-Free BEOL Cleaning with Megasonic Agitation
  Published in: Ultra Clean Processing of Silicon Surfaces VI (p151)
• Megasonic, Non-Contact Cleaning Followed by 'Rotagoni' Drying of CMP Wafers
  Published in: Ultra Clean Processing of Silicon Surfaces V (p251)
• Non-Contact Post Cu CMP Cleaning Using Megasonic Energy
  Published in: Ultra Clean Processing of Silicon Surfaces V (p39)
• Preparation, Characterization, and Damage-Free Processing of Advanced Multiple-Gate FETs
  Published in: Ultra Clean Processing of Semiconductor Surfaces VIII (p213)