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Articles by author: Névine Rochat

• Critical Thickness Threshold in HfO₂ Layers
  Published in: Ultra Clean Processing of Semiconductor Surfaces VIII (p67)
• Detection and Identification of Organic Contamination on Silicon Substrates
  Published in: Ultra Clean Processing of Silicon Surfaces V (p111)
• Dry Cleaning of Organic Contamination on Silicon Wafers Using Rapid Optical Surface Treatment
  Published in: Ultra Clean Processing of Silicon Surfaces V (p59)
• Interfacial Strain and Defects in Si (001) Carbonization Layers for 3C-SiC Hetero-Epitaxy
  Published in: Silicon Carbide and Related Materials 2003 (p277)
• Modelling the Growth of Chemical Oxide for Advanced Surface Preparation
  Published in: Ultra Clean Processing of Silicon Surfaces VI (p187)
• Single Wafer Hydrophobic Surface Preparation on 300mm by HF Vapor
  Published in: Ultra Clean Processing of Semiconductor Surfaces VIII (p11)
• Thermal Evolution of (100) Silicon and Chemical Oxides as Seen by ATR Spectroscopy
  Published in: Ultra Clean Processing of Silicon Surfaces VI (p183)