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Papers by Author: R. Novak

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In Situ Wafer Processing for Next Generation Devices

Authors: Ismail Kashkoush, Lewis Liu, Nick Yialamas, R. Novak

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Wafer Surface Preparation Requirements for Next-Generation Devices

Authors: Ismail Kashkoush, G. Chen, R. Novak

191

Post CMP Cleaning Using a Novel HF Compatible High Power Magasonic Tank

Authors: F. Tardif, T. Lardin, I. Constant, M. Fayolle, Pieter Boelen, C. Cowache, Ismail Kashkoush, R. Novak

169

Optimization of Deionized Water Consumption in Wafer Wet Processing

Authors: Ismail Kashkoush, R. Novak

49

New Aspects of the Diluted Dynamic Clean Process

Authors: F. Tardif, T. Lardin, A. Maciejny, Adrien Danel, Pieter Boelen, C. Cowache, Ismail Kashkoush, R. Novak

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