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Papers by Author: Robert Small

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Corrosion Inhibaitors for Copper in Hydroxylamine-Based Chemistries Used for CMP and Post-CMP Cleaning

Authors: Subramanian Tamilmani, Wayne Huang, Srini Raghavan, Robert Small

271

Investigating Post CMP Cleaning Processes for STI Ceria Slurries

Authors: Robert Small, Pascal Berar, Brandon Scott

63

The Effect of DI Water and Intermediate Rinse Solutions on Post Metal Etch Residue Removal Using Semi-Aqueous Cleaning Chemistries

Authors: Simon J. Kirk, Robert Small

307

Contamination and Cleaning of Oxide Areas Exposed During Copper CMP in Hydroxylamine Based Slurries

Authors: C. Shang, Wayne Huang, Srini Raghavan, Zhe Fei Chen, Robert Small, M. Peterson, Jeong Sic Jeon

295

Reduced Water Consumption for Post Clean Treatment and Metal Ion Contamination on VLSI Structures

Authors: Robert Small, Zhe Fei Chen, Cherry Wang, Becky Hon

97