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Articles by keyword: «Gate Dielectric»

• Advanced Gate Dielectric Development for VLSI Technology
  Published in: Rapid Thermal Processing and beyond: Applications in Semiconductor Processing (p133)
• Characteristics of ZrO₂/Al₂O₃ Bilayer Film for Gate Dielectric Applications Deposited by Atomic Layer Deposition Method
  Published in: Designing, Processing and Properties of Advanced Engineering Materials (p497)
• Improved Electrical Properties and Thermal Stability of GeON Gate Dielectrics Formed by Plasma Nitridation of Ultrathin Oxides on Ge(100)
  Published in: Technology Evolution for Silicon Nano-Electronics (p152)
• Initial Stages of Thermal Oxidation of 4H-SiC (11-20) Studied by Photoelectron Spectroscopy
  Published in: Silicon Carbide and Related Materials 2003 (p1317)
• Interfacial Reaction-Controlled Deposition and Micropatterning of Oxide Thin Films for Gate Dielectrics
  Published in: Ceramic Interfaces: Properties and Applications V (p139)
• Investigation of Ultra Thin Thermal Nitrided Gate Dielectrics in Comparison to Plasma Nitrided Gate Dielectrics for High-Performance Logic Application for 65nm
  Published in: Rapid Thermal Processing and beyond: Applications in Semiconductor Processing (p153)
• Negative Field Reliability of ONO Gate Dielectric on 4H-SiC
  Published in: Silicon Carbide and Related Materials 2007 (p795)
• Sputtering Preparation of Silicon Nitride Thin Films for Gate Dielectric Applications
  Published in: Advanced Materials Forum II (p69)
• Structural and Electronic Properties of the 6H-SiC(0001)/Al₂O₃ Interface Prepared by Atomic Layer Deposition
  Published in: Silicon Carbide and Related Materials 2003 (p1369)