Simulation of Substrate Temperature Distribution in Diamond Films Growth on Cemented Carbide Inserts by Hot Filament CVD

Wei Zuo; Bin Shen; Fang Hong Sun; Ming Chen

doi:10.4028/www.scientific.net/AMM.10-12.864

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HomeApplied Mechanics and MaterialsApplied Mechanics and Materials Vols. 10-12Simulation of Substrate Temperature Distribution...

Simulation of Substrate Temperature Distribution in Diamond Films Growth on Cemented Carbide Inserts by Hot Filament CVD

Abstract:

Three-dimensional finite element simulations were used to investigate the influences of various hot filaments and other deposition parameters on the temperature field of substrates which affect significantly the growth and quality of diamond films by hot filament chemical vapor deposition (HFCVD) and based on the simulation results, the optimum position for diamond deposition was found. In the experiment, six cemented tungsten carbide inserts were used as substrates and placed on the workbench in the CVD reactor to deposit diamond films. According to the temperature distribution on substrates measured by thermocouple fixed in CVD reactor, the simulations were validated and the optimum arrangement of substrates was established from the simulation results. In addition, the simulation model was altered to optimize the process parameters of HFCVD deposition, and an improved process of depositing diamond films with high quality was obtained in order to achieve the great surface morphology, which laid the foundation of developing a new method to arrange the substrates in the CVD reactor for depositing diamond films.

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Periodical:

Applied Mechanics and Materials (Volumes 10-12)

Pages:

864-868

DOI:

https://doi.org/10.4028/www.scientific.net/AMM.10-12.864

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Online since:

December 2007

Authors:

Wei Zuo, Bin Shen, Fang Hong Sun, Ming Chen

Keywords:

Diamond Film, Hot Filament Chemical Vapor Deposition (HFCVD), Simulation, Temperature Field

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References

[1] F.H. Sun, Z.M. Zhang, M. Chen and H.S. Shen: Journal of Materials Processing Technology, Vol. 129 (2002), p.435.

Google Scholar

[2] T. Wang, H.W. Xin, Z.M. Zhang, Y.B. Dai and H.S. Shen: Diamond and Related Materials, Vol. 13 (2004), p.6.

Google Scholar

[3] A.Y. Wang, C. Sun, H.T. Cao, A.L. Ji, R.F. Huang and L.S. Wen: Modelling and Simulation in Materials Science and Engineering, Vol. 12 (2004), p.325.

Google Scholar

[4] C.B. Divani, F.V.N. Helcio and R.B. Manricio: Brazilian Journal of Physics, Vol. 36 (2006), p.313.

Google Scholar