The Research of the C-Doped TiO₂ Films Deposited by Arc Ion Plating

Abstract:

The uniform and transparent C-doped TiO₂ thin films were successfully deposited on medical glass slide by arc ion plating. The influences of the C-doped quantity, pulsed negative bias and annealing treatment on films properties were investigated. Film structure, surface morphologies and optical properties were measured with XRD, SEM and UV-VIS transmittance spectroscope. Photo-catalytic performance of the films was evaluated by degrading methyl orange. The results show that the C-doped quantity and annealing treatment have important influence on the absorption edges. The effect of annealing treatment is similar to that of the increasing the C-doped quantity, and they can enhance the C doping and extends the absorption edge. The absorption edges of the films increase with the rising of the C-doped quantity, and all the films absorption edges increase after annealing at 400°Cfor 4h, and the best extending can increase 20nm after annealing. Along with the negative bias increasing, the intensity of rutile diffraction peak increases, but the anatase decreases. The micro-morphology and crystal structure of different C-doped quantity are mutually correspond. The roughness and grain size of TiO₂ films surface decreases significantly with the negative bias increasing. The crystal grains become even and fine, the high bias films surface micro-morphology has rice-like granular shape.

• Periodical: Applied Mechanics and Materials (Volumes 182-183)
• Pages: 292-296
• DOI: https://doi.org/10.4028/www.scientific.net/AMM.182-183.292
• Online since: June 2012
• Authors: Shu Juan Zhang, Ming Sheng Li, Zhi Qin Chen, Yong Zhong Fan
• Keywords: Arc Ion Plating, C-Doped Quantity, C-Doped TiO₂, Pulsed Negative Bias

References

[1] J.T. Chang, C.W. Su and J.L. He: Surface& coating Technology. Vol. 200 (2006), p.3027.

[2] J. Shi,J. Li,Y.F. Cai: Acta Phys. -Chim Sin. Vol. 24(2008), p.1283.

[3] W. Zhao, W.H. Ma: Journal of American Chemical Society. Vol. 126(2004), p.4782.

[4] J.T. Chang, Y.F. Lai and J.L. He: Surface& coating Technology. Vol. 200 (2005), p.1640.

[5] M. Zhang, G.Q. Lin, W.S. L: Surface& coating Technology. Vol. 201 (2007), p.7252.

[6] H. Yumoto, S. Matsudo and K. Akashi: Vacuum. Vol. 65 (2002), p.509.

[7] S.J. Zhang, M.S. Li, Z.Q. Chen: Advanced Materials Research. Vol. 345(2012), p.88.

[8] Li Mingsheng, Zhang Shujuan, Loujin: Tran. Nonferrous Met. Soc. Vol. 17 (2007), p.829.