Electroless Deposition of Silver Layer on Silicon of High Density Plasma Bombarment

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Abstract:

Electroless silver film was deposited on the Ti/Si substrate which was suffered from plasma bombardment to modify its surface chemistry. The surface tension of the Ti/Si surface was found to be reduced after plasma bombardment. After thermal annealing, the silver film was smoothened and showed a fine microstructure. However, the recrystal at high temperature annealing facilitated an increase of sheet resistance instaneously.

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474-477

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July 2012

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© 2012 Trans Tech Publications Ltd. All Rights Reserved

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