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Electroless Deposition of Silver Layer on Silicon of High Density Plasma Bombarment
Abstract:
Electroless silver film was deposited on the Ti/Si substrate which was suffered from plasma bombardment to modify its surface chemistry. The surface tension of the Ti/Si surface was found to be reduced after plasma bombardment. After thermal annealing, the silver film was smoothened and showed a fine microstructure. However, the recrystal at high temperature annealing facilitated an increase of sheet resistance instaneously.
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474-477
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Online since:
July 2012
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© 2012 Trans Tech Publications Ltd. All Rights Reserved
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