Electroless Deposition of Silver Layer on Atomic-Layer-Deposited TiN

Yuan Gee Lee

doi:10.4028/www.scientific.net/AMM.190-191.471

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HomeApplied Mechanics and MaterialsApplied Mechanics and Materials Vols. 190-191Electroless Deposition of Silver Layer on...

Electroless Deposition of Silver Layer on Atomic-Layer-Deposited TiN

Abstract:

A laminate of silver/atomic layer deposition TiN/Si was prepared to research the thermal reliability. The atomic layer TiN was subjected into different kinds of plasma to modify its surface chemistry. The surface tension of the TiN/Si surface was found to be reduced by O2 plasma bombardment. The reaction mechanism of the continuum of silver film was also explored in this paper.

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Periodical:

Applied Mechanics and Materials (Volumes 190-191)

Pages:

471-473

DOI:

https://doi.org/10.4028/www.scientific.net/AMM.190-191.471

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Online since:

July 2012

Authors:

Yuan Gee Lee

Keywords:

Atomic Layer Deposition, Electroless Silver, O₂ Plasma Bombardment, Surface Tension

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