Analysis of Optical Characteristics of Transparent Electrode ITO Material in FPD Routing Process

Abstract:

ITO transparent film was deposited on glass substrates by RF-magnetron sputtering equipment as electrode, routing material and the photolithography process was studied. The results shown that the ITO based transparent electrode routing needs larger dose energy than that Mo based substrate when the PR processes were all identical. The photo resist cannot be exposed thoroughly where the length/width ratio of gap between routing serried lines lager than 80 as the typical Mo based exposure process. The width of gap reached to 8.7um which was the limit of exposure machine of transparent film after the 2000um-length, 4um-width gap was exposed thoroughly. It should be attention of the routing gap design for electrical characters in transparent flat panel display.

• Periodical: Applied Mechanics and Materials (Volumes 198-199)
• Pages: 95-98
• DOI: https://doi.org/10.4028/www.scientific.net/AMM.198-199.95
• Online since: September 2012
• Authors: Long Long Chen, Xi Feng Li, Ji Feng Shi, Chang Zhou, Jian Hua Zhang
• Keywords: Exposure, ITO, Photolithography, Routing, Transparent

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