[1]
M. Koyanagi, H. Kurino, K.W. Lee, K. Sakuma, N. Miyakawa, H. Itani, Future System-on-Silicon LSI Chip, IEEE Micro, Vol. 18, No, 4, (1988), pp.17-22.
DOI: 10.1109/40.710867
Google Scholar
[2]
L. C. Shen, C. W. Chien, H. C. Cheng, C. T. Lin, Development of Three-dimensional Chip Stacking Technology Using a Clamped Through-silicon via Interconnection, Microelectronics Reliability, 50, Issue 4, (2010), pp.489-497.
DOI: 10.1016/j.microrel.2009.10.012
Google Scholar
[3]
E. K. Kim, Assessment of ultra-thin Si wafer thickness in 3D wafer stacking , Microelectronics Reliability, 50, Issue 2, (2010). pp.195-198.
DOI: 10.1016/j.microrel.2009.10.002
Google Scholar
[4]
Ching-I Chen, Fu-Chen Cheng, Chau-Jie Zhan and Tao-Chih Chang, Parameter Study to the interposer Stress Analysis of Fine Pitch 3-D Stack Package, The 5th International Microsystems, Packaging, Assembly and Circuits Technology Conference, Taipei, Taiwan, October 20-22, (2010).
DOI: 10.1109/impact.2010.5699608
Google Scholar
[5]
S. W. Yoon, D. W. Yang, J. H. Koo, M. Padmanathan and F. Carsom, 3D TSV Processes and its Assembly/Packaging Technology, IEEE International Conference on 3D System Integration, (2009), pp.1-5.
DOI: 10.1109/3dic.2009.5306535
Google Scholar
[6]
T. Chidambaram, C. McDonough, R. Geer, W. Wang, TSV Stress Testing and Modeling for 3D IC Applications, 16th IEEE International Symposium on the Physical and Failure Analysis of Integrated Circuits, IPFA, (2009), pp, 727-730.
DOI: 10.1109/ipfa.2009.5232736
Google Scholar
[7]
H. Kitada, N. Maeda, K. Fujimoto, K. Suzuki, A. Kawai, K. Arai, T. Suzuki, T. Nakamura and T. Ohba, Stress Sensitivity Analysis on TSV Structure of Wafer-on-a-Wafer (WOW) by the Finite Element Method (FEM), IEEE International Interconnect Technology Conference, IITC, (2009).
DOI: 10.1109/iitc.2009.5090354
Google Scholar
[8]
C. S. Selvanayagam, J.H. Lau, X. Zhang, S. K. W. Seah, K. Vaidyanathan and T. C. Chai, Nonlinear Thermal Stress/ Strain Analyses of Copper Filled TSV (Through Silicon Via) and Their Flip-Chip Microbumps, IEEE Transactions on Advanced Packaging , Vol. 32, No. 4, (2009).
DOI: 10.1109/tadvp.2009.2021661
Google Scholar
[9]
C. Noritake, P. Limaye, M. Gonzalez and Bart Vandevelde, Thermal Cycle Reliability of 3D Chip Stacked Package Using Pb-free Solder Bumps: Parameter Study by FEM Analysis, 7th. Int. Conf: on Thermal, Mechanical and Multiphysics Simulation and Experiments in Micro-Electronics and Micro-Systems, EuroSimE (2006).
DOI: 10.1109/esime.2006.1644002
Google Scholar
[10]
Mohammad M Hossain, Yongje Lee, Roksana Akhter, and Dereje Agonafer, Computational Modeling of the Reliability of Stacked Low Density Interconnects Devices, The Tenth Intersociety Conference on Thermal and Thermomechanical Phenomena in Electronics Systems, (2006).
DOI: 10.1109/itherm.2006.1645466
Google Scholar
[11]
Zhaohui Chen, Bin Song, XueFang Wang, Sheng Liu, Thermo-mechanical Reliability Analysis of 3D Stacked-die Packaging with Through Silicon Via, The 11th International Conference on Electronic Packaging Technology & High Density Packaging, (2011).
DOI: 10.1109/icept.2010.5582479
Google Scholar
[12]
C. I. Chen, S. C. Wu, D. S. Liu, C. Y. Ni and T. D. Yuan, Global-to-Local Modeling and Experiment Investigation of a HFCBGA Package Board-level Solder Joint Reliability, International Microelectronics And Packaging Society, JMEP, Vol. 4, No, 4, 4th Qtr. (2007).
DOI: 10.4071/1551-4897-4.4.186
Google Scholar
[13]
John H.L. Pang, T.H. Low, B. S. Xion and F. X. Che, Design For Reliability (DFR) Methodology For Electronic Package Assemblies, Electronics Packaging Technology Conference, (2003), pp.470-478.
DOI: 10.1109/eptc.2003.1271567
Google Scholar
[14]
C. S. Selvanayagam, J. H. Lau, X. Zhang, S. K.W. Seah, K. Vaidyanathan and T. C. Chai, Nonlinear Thermal Stress/ Strain Analyses of Copper Filled TSV (Through Silicon Via) and their Flip-Chip Microbumps, IEEE Electronic Components and Technology Conference, (2008).
DOI: 10.1109/ectc.2008.4550108
Google Scholar