The Optimal Radius Calculation and Error Analyses of the “0,π” Phase Pupil Mask

Abstract:

Abstract. A diffraction limited circularly symmetric optical imaging system with “0,π” phase pupil mask was studied, which extended depth of field. The optimal radiuses of the mask in the different amount of defocus are calculated, which in a certain contrast value 0.05 and 0.1, can provide the largest spatial frequency band. On the other hand, the effect of mask manufacturing error is analyzed, and the performance of the simulation imaging system has been verified experimentally that the image system still can obtain the high quality output images even without any post-processing.

• Periodical: Applied Mechanics and Materials (Volumes 278-280)
• Pages: 50-53
• DOI: https://doi.org/10.4028/www.scientific.net/AMM.278-280.50
• Online since: January 2013
• Authors: Qing Hua Lv, Xiao Zhu, Zhong Bao Xu, Zhong Sheng Zhai, Shuang Zou
• Keywords: Cut-Off Frequency (PCF), Manufacturing Error, Optimal Radius, Phase Pupil Mask

References

[1] Z.S. Zhai, S.T. Ding, Q.H. Lv, X.Z. Wang, Y.N. Zhong, J. Mod. Optic, Vol. 56(2009), p.1304.

[2] E Ben-Eliezer, E Marom, N Konforti, Z Zalevsky, Applied Optics, Vol. 44(2005), p.2792.

DOI: 10.1364/ao.44.002792

[3] G. Mikula, A. Kolodziejczyk, M, Makowski, Optical Engineering, Vol. 44(2005), p.058001.

[4] E Ben-Eliezer, N Konforti, B Milgrom, E Marom, Opt. Express, Vol. 16(2008), p.20540.

DOI: 10.1364/oe.16.020540

[5] Q.H. Lv, Z.S. Zhai, X. Zhu, Z.B. Xu, X.Z. Wang, Optics Communications, Vol. 285(2012), p.960.

[6] S. Liu, H. Hua, Opt. Express, Vol. 19(2011), p.353.